Kameshwar Poolla, professor of mechanical engineering, and co-authors Professor Costas Spanos and Charlie Zhang (PhD ME 2007), have been awarded the 2007 IEEE Transactions on Semiconductor Manufacturing Best Paper Award for their paper, "Across Wafer Critical Dimension Uniformity Enhancement Through Lithography and Etch Process Sequence: Concept, Approach, Modeling, and Experiment." The paper appeared in the November 2007 issue.

Poolla and co-authors will be presented with their award at the ASMC conference, May 5-7 at the Hyatt Regency in Cambridge, MA.